grant
Development of new main group resists for electron beam lithography and direct writing of nanostructures
Organization UKRILocation United Kingdom
UKRIUK ResearchGrantActive
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This research project will be focused on the preparation of main group compounds and complexes containing elements from both group 13, 14, 15 and 16. These complexes will then be cast into thin films and investigated in pattern fabrication using electron-beam lithography (EBL) and extreme ultraviolet (EUV) lithography. Incorporation of heavy group…
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