grant

Field Effected Aerosol Assisted Chemical Vapour Deposition of Thin Film Materials

Organization UKRILocation United Kingdom
UKRIUK ResearchGrantActive
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Thin inorganic films as seen in metal oxide semiconductors can perform wide-ranging electronic and energy storage applications and possess great potential for both industry and society. Metal oxide materials generated by Aerosol Assisted Chemical Vapour Deposition (AACVD) typically form in a specific orientation of crystallinity and structure,…

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Field Effected Aerosol Assisted Chemical Vapour Deposition of Thin Film Materials — UKRI | United Kingdom | Dev Procure