grant

ECLIPSE-CHIPS: High-Fluence Coherent EUV Light from Ultraintense Laser-Plasma Interactions for Advanced Nanolithography and Metrology

Organization Princeton UniversityLocation PRINCETON, United StatesPosted 1 Sept 2025Deadline 31 Aug 2028
NSFUS FederalResearch GrantScience FoundationNJ
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This award is made in response to Dear Colleague Letter 24-130, as part of the ECosystem for Leading Innovation in Plasma Science and Engineering (ECLIPSE) interdisciplinary program. Extreme ultraviolet (EUV) light is crucial for creating faster and smaller electronic devices, such as the microchips in smartphones and computers. By producing more…

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ECLIPSE-CHIPS: High-Fluence Coherent EUV Light from Ultraintense Laser-Plasma Interactions for Advanced Nanolithography | Dev Procure