grant
Collaborative Research: DMREF: AI-Informed, Closed-Loop Design of Negative Resists for High-Volume EUV Lithography
Organization University of Wisconsin-MadisonLocation MADISON, United StatesPosted 1 Oct 2025Deadline 30 Sept 2029
NSFUS FederalResearch GrantScience FoundationWI
Description preview
Non-technical Description: The mass production of integrated circuits (commonly known as ‘microchips’ or simply ‘chips’) is a key driver for modern computational advances. Chip manufacturing requires a process called photolithography to template the intricate patterns of electronic components. This process uses patterns of light to selectively…
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